File:Limiting case in silicon oxidation - diffusion controlled regime.png
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Summary[edit | edit source]
| Description |
Limiting case in silicon oxidation - diffusion controlled regime Reference: Plummer, Deal, and Griffin. Silicon VLSI Technology |
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| Source |
Own work |
| Date |
2008 |
| Author | |
| Permission (Reusing this file) |
See below.
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Licensing[edit | edit source]
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I, the copyright holder of this work, hereby release it into the public domain. This applies worldwide. If this is not legally possible:
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File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 05:47, 2 February 2008 | | 395 × 272 (10 KB) | Dgray (discuss | contribs) | Limiting case in silicon oxidation - diffusion controlled regime Reference: Plummer, Deal, and Griffin. Silicon VLSI Technology |
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