File:Flux from gas phase to silicon surface.png
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Flux_from_gas_phase_to_silicon_surface.png (572 × 343 pixels, file size: 16 KB, MIME type: image/png)
Summary[edit | edit source]
Description |
First-Order Planar Growth Kinetics of Oxidation Reference: Plummer, Deal, and Griffin. Silicon VLSI Technology |
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Source |
Own work |
Date |
2008 |
Author | |
Permission (Reusing this file) |
See below.
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Licensing[edit | edit source]
I, the copyright holder of this work, hereby release it into the public domain. This applies worldwide. If this is not legally possible:
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File history
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 05:37, 2 February 2008 | 572 × 343 (16 KB) | Dgray (discuss | contribs) | First-Order Planar Growth Kinetics of Oxidation Reference: Plummer, Deal, and Griffin. Silicon VLSI Technology |
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